Oxford Instruments NanoScience designs, supplies and supports market-leading research tools that enable quantum technologies, new materials and device development in the physical sciences Oxford ...
The final version of Method 205 was published by the EPA on May 30, 1005 for inclusion in Appendix M of 40 CFR Part 51 entitled, 'Verification of Gas Dilution Systems for Field Instrument Calibrations ...
ABSTRACT The objective of this work is to improve the understanding of variables like dilution and sampling conditions that contribute to particle-based emission measurements by assessing and ...
The method of Chemical mechanical polishing/planarization (CMP) is commonly employed in the microelectronic industries to smooth surfaces with a blend of chemical and mechanical forces. This method ...
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