As the unstoppable progression of Moore’s law has driven the semiconductor technology roadmap farther and farther below 1 µm, a steady stream of engineering marvels has been required to produce ...

Double patterning (DP), as the simplest form of multi-patterning techniques, is receiving lots of attention right now. The need for double patterning techniques is driven by the physical limits of the ...

Scanner resolution improvements have diminished since the 193-nm wavelength became commonplace. Today’s technologies are sufficient for 28-nm IC designs using immersion, but not beyond without ...

According to Applied Materials, it is. As 32 nm technologies ramp within the next two years, the extension of optical lithography to meet patterning requirements is the industry’s most urgent ...

Double patterning is a class of technologies developed for photolithography to enhance the feature density of computer chips. The resolution of a photoresist pattern begins to blur at around 45 nm ...

As major foundries announce the release of their 1.0 versions of 20 nm processes, we now see IC designers moving to production design and implementation of integrated circuits at this node. For many ...

In our last post, we looked at the basics of finFET technology and how its increased complexity and constraints influence layout design choices. In this post, we’ll look at more advanced technology ...