B, the first High-NA EUV lithography tool designed for commercial production, reiterating Intel's plans to use High-NA EUV patterning for 14A process technology and onwards.
Morning Overview on MSN
ASML’s top EUV tool is now key to Intel’s comeback plan
Intel’s comeback in cutting edge manufacturing is no longer a vague roadmap, it now revolves around a single, spectacular ...
Intel recently confirmed the latest results in its partnership with ASML. The US chipmaker worked with engineers from the European corporation to install, test, and validate ...
ASML has delivered a first-generation Twinscan EXE:5000 High-NA extreme ultraviolet (EUV) lithography scanner to Intel, seven years after Intel first ordered the machine. The High numerical aperture ...
Dutch chip gear maker ASML has lifted the kimono its Twinscan XT:260, a new lithography scanner built for the brave new world of 3D chip packaging. The outfit claims that it is the first machine of ...
TL;DR: ASML is selling a Lego set of its TWINSCAN EXE:5000 High-NA EUV lithography machine exclusively to employees for its 40th anniversary. Despite public interest, ASML confirmed it remains an ...
Belgian R&D company Imec has reported a number of chip making breakthroughs at the joint lab it runs with EUV lithography company ASML. According to Imec, it has successfully printed circuit patterns ...
ASML has released its financial results for the third quarter of 2025, reporting a total net sales of €7.5 billion, with a gross margin of 51.6 percent, and net income of €2.1 billion. ASML also ...
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